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Focus Scanner Product List

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High Load Objective Lens Focus Scanner P-726

High Load Objective Lens Focus Scanner P-726

A stroke of 100 µm, a system resolution of 0.4 nm, and a resonance frequency of 560 Hz even at a load of 210 g.

The P-726 is a PIFOC® high-load focus scanner that drives heavy high NA objective lenses with high speed and precision. It features built-in flexure guides and capacitive sensors, achieving an OpenLoop resolution of 0.3 nm and a linearity error of 0.02%. The resonance frequency is maintained at 1120 Hz without load and 560 Hz with a 210 g load, accelerating Z-scanning for semiconductor wafer inspection and confocal/super-resolution microscopy. It supports major thread sizes such as M32/M27 with the QuickLock adapter. *For more details, please download the PDF or contact us.*

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[P-725.xCDE2 Focus Scanner for Semiconductor Inspection]

[P-725.xCDE2 Focus Scanner for Semiconductor Inspection]

High-precision Z-focus scanner for semiconductor inspection equipment with sub-nanometer resolution and maximum 800 µm stroke capability.

In semiconductor inspection equipment, high-resolution Z-axis position control and rapid step motion are required for detecting fine defects and evaluating 3D focus. The P-725.xCDE2 PIFOC focus scanner is a high-precision actuator that achieves sub-nanometer resolution with a maximum focus range of 800 µm. By combining the PICMA piezo actuator with a flexure guide mechanism that incorporates capacitive sensors, high linearity, reproducibility, and stability are realized. This enables high-precision control of Z focus and high-speed scanning in semiconductor inspection, contributing to improved accuracy in the inspection process and enhanced throughput of the equipment. [Application Scenarios] - Z focus control for wafer surface defect inspection - High-resolution imaging in chip and package inspection - High-speed Z scanning in optical and laser-based inspection equipment - Defect analysis using optical inspection and confocal optical microscopy [Benefits of Implementation] - Improved measurement accuracy through high-precision focus control - Enhanced inspection throughput due to rapid Z step motion - Increased reliability of the equipment with stable long-term operation

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Maximum 800µm long stroke objective focus P-725.xCDE2

Maximum 800µm long stroke objective focus P-725.xCDE2

Sub-nanometer resolution, maximum operation of 800 µm, high-speed and high-precision PIFOC(R) focus scanner.

The P-725.xCDE2 is a focus scanner for objective lenses that employs a flexure guide structure and PICMA® piezo technology. The capacitive sensor achieves sub-nanometer resolution and 0.02% linearity, maintaining high precision even with long strokes of 100 / 400 / 800 µm. With zero wear parts and no need for lubrication, it offers a long lifespan. It contributes to the acceleration of Z-step in confocal and multiphoton microscopy as well as semiconductor inspection. *For more details, please download the PDF or contact us.

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Long Stroke Objective Focus for Optical Measurement P-725.xCDE2

Long Stroke Objective Focus for Optical Measurement P-725.xCDE2

Sub-nanometer resolution, compatible with maximum 800 µm stroke, high-speed and high-precision PIFOC focus scanner.

In the field of optical measurement, the focus accuracy and stability of the detection position are directly linked to the precision of the results in optical imaging and precise measurement. Applications that require evaluation of fine structures or high-speed data acquisition demand high-resolution focus control and responsive operational performance. The P-725.xCDE2 PIFOC focus scanner achieves sub-nanometer resolution position control with a maximum stroke of 800 µm. Equipped with PICMA piezo actuators and high-precision capacitive sensors in a flexure guide mechanism, it provides high linearity and reproducibility in Z-direction focus adjustment for optical measurement devices. This helps to minimize the impact of focus position shifts in optical measurements, contributing to improved measurement accuracy and device yield. 【Use Cases】 - High-precision measurements with confocal microscopy - High-speed Z-scanning in multiphoton microscopy - High-resolution imaging evaluation devices - Optical interferometers and phase measurement devices 【Benefits of Implementation】 - Sub-nanometer resolution focus control - Wide measurement range with a maximum stroke of 800 µm - Reduced inspection and measurement time due to high-speed response - Long-term stability through PIFOC/flexure structure

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[P-725.xCDE2 for Biotechnology]

[P-725.xCDE2 for Biotechnology]

Sub-nanometer resolution, Z-direction maximum stroke of 800 µm, equipped with a flexure mechanism focus scanner.

In the field of biotechnology, precise focus control is essential for high-resolution observation of the fine structures of cells and tissues in microscopic imaging applications. This is particularly true for 3D imaging techniques such as confocal microscopy and multiphoton microscopy, where high resolution and fast responsiveness along the Z-axis (focus direction) directly impact observation accuracy. The P-725.xCDE2 PIFOC Focus Scanner employs a flexure guide mechanism with PICMA piezo actuators and capacitive sensors to achieve precise focus control with sub-nanometer resolution. It also supports a maximum stroke of 800 µm, enabling fast and high-precision scanning over a wide range in the depth direction. These characteristics help reduce observation time while minimizing focus position shifts, ultimately contributing to improved reliability and efficiency of experiments. 【Application Scenes】 - Confocal microscopy - Multiphoton microscopy - 3D imaging - Live cell imaging - High-throughput microscopy screening 【Benefits of Implementation】 - High-precision Z-direction focus control - Expanded range of focus stroke - Improved observation efficiency through fast scanning - Stable imaging quality

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Lens Focus Scanner P-726 for Nanotechnology

Lens Focus Scanner P-726 for Nanotechnology

High-load compatible sub-nanometer resolution focus scanner supporting nano-structure analysis

In the field of nanotechnology structural analysis, high-precision Z-direction focus control at the nanoscale is essential. The P-726 PIFOC is a high-load compatible focus scanner that achieves a stroke of 100 µm and sub-nanometer resolution (approximately 0.3 nm class). Direct feedback from a capacitive sensor and a flexure guide structure provide high positioning accuracy and reproducibility. Its high-speed settling performance of about 6 ms contributes to the efficiency of nanostructure observation and 3D imaging involving Z-scanning. 【Application Scenarios】 - Nanostructure observation using confocal microscopy - Z-scanning in super-resolution optical microscopy - Optical nanostructure analysis devices - 3D imaging evaluation devices 【Benefits of Implementation】 - High-precision focus control with sub-nanometer resolution - Improved measurement efficiency due to high-speed settling - Increased design flexibility of optical systems due to high load compatibility - Enhanced reproducibility through long-term stable operation

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Objective Focus for Nanotechnology P-725.xCDE2

Objective Focus for Nanotechnology P-725.xCDE2

Sub-nanometer resolution, focus scanner P-725.xCDE2 with a maximum movement of 800 µm.

In the field of nanotechnology, high-resolution and stable focus position control is required for the observation and evaluation of nanoscale structures. The P-725.xCDE2 PIFOC is a focus scanner for objective lenses that features a maximum travel range of 800 µm (depending on the model) and sub-nanometer resolution (when used with the appropriate controller). It achieves smooth Z-axis motion without friction or backlash through a piezo actuator and flexure guide mechanism. It is suitable for focus adjustment and Z-scan applications at the nanoscale in microscopy systems. 【Application Scenarios】 - Z-scanning in confocal microscopy - Focus position control in multiphoton microscopy - Height adjustment in semiconductor wafer inspection - Precise focus control during the observation of nanostructures 【Benefits of Implementation】 - Sub-nanometer resolution focus position control - High reproducibility motion without backlash - Wide Z travel range of up to 800 µm (depending on the model) - Flexure guide structure with no wear parts

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Lens Focus Scanner P-726 for Semiconductor Wafer Inspection

Lens Focus Scanner P-726 for Semiconductor Wafer Inspection

High-load compatible, high-precision Z-focus scanner supporting high throughput in wafer inspection.

In semiconductor wafer inspection, high-resolution Z-axis focus control and fast responsiveness are required to stably detect fine defects. Particularly in optical inspection systems using high NA objectives, focus accuracy and reproducibility are directly linked to the reliability of inspection results. The P-726 PIFOC high-load objective lens focus scanner achieves a Z stroke of up to 100 µm with sub-nanometer resolution in position control. Direct position feedback from a capacitive sensor and a flexure guide structure provide high linearity, repeatability, and long-term stability. Furthermore, its high-speed settling performance of approximately 6 ms contributes to the optimization of inspection processes involving Z-step movements. Due to its high-load design, stable operation is possible even when using high NA objectives or additional optical components. [Application Scenarios] - Z focus control in optical inspection of semiconductor wafer surfaces - Defect analysis equipment using high NA objectives - Three-dimensional inspection using confocal optical systems - Z scanning in laser and optical interference inspection devices [Benefits of Implementation] - Improved measurement stability through high-precision focus control - Reduced Z step time due to high-speed settling - Increased design flexibility of optical systems due to high-load capability

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Optical High Load Objective Lens Focus Scanner P-726

Optical High Load Objective Lens Focus Scanner P-726

100 µm stroke, 0.4 nm resolution, compatible with high-load objective lenses, high-speed and high-precision PIFOC focus scanner.

In the focus control of objective lenses in optical instruments and measurement devices, high-precision Z positioning and fast response are required. Particularly when the objective lens is large and has a high numerical aperture (NA), conventional mechanisms face challenges in operational response and stability, which can affect measurement accuracy and observation quality. The P-726 PIFOC high-load objective lens focus scanner achieves high-precision focus control with sub-nanometer resolution obtained through direct measurement using capacitive sensors, with a maximum stroke of 100 µm. Additionally, the flexure guide structure eliminates friction and backlash, maintaining high rigidity and stability even under high-load conditions. This enhances the accuracy and throughput of optical measurement devices, increasing the reliability of measurements and observations. [Application Scenarios] - Precision focus control of objective lenses - Z-scanning for confocal microscopes and super-resolution microscopes - 3D optical imaging devices - High-precision optical measurement devices (interferometers, autofocus systems) [Benefits of Implementation] - Improved optical measurement accuracy through high-precision Z position control - Reduced inspection and observation time due to fast operational response - High-load performance compatible with heavy lenses - Long-term stability and low maintenance requirements

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